q to manage “EUV” masks and “EUV” reticles made for built-in circuits, not specified by 3B001.g, and having a mask “substrate blank” specified by 3B001.j.” A technical Take note is included to clarify that masks or reticles with a mounted pellicle are regarded as masks and reticles. For these factors, BIS is adding ECCN 3A904 for the… Read More